- mask-proximity correction
- корекція [компенсація] ефекту близькості у фотолітографії (для підвищення роздільної здатності)
English-Ukrainian dictionary of microelectronics. 2013.
mask-proximity correction
Смотреть что такое "mask-proximity correction" в других словарях:
Optical proximity correction — An illustration of optical proximity correction. The blue Γ like shape is what we d like printed on the wafer, in green is the shape after applying optical proximity correction, and the red contour is how the shape actually prints (quite close to … Wikipedia
Mask data preparation — (MDP) is the step that translates an intended set of polygons on an integrated circuit layout into a form that can be physically written by the photomask writer. Usually this involves fracturing complex polygons into simpler shapes, often… … Wikipedia
Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as … Wikipedia
Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… … Wikipedia
Nanolithography — Part of a series of articles on Nanoelectronics Single molecule electronics … Wikipedia
Photomask — A photomask. A schematic illustration of a photomask (top) … Wikipedia
Fotolithografie (Halbleitertechnik) — Die Fotolithografie (auch Photolithographie) ist eine der zentralen Methoden der Halbleiter und Mikrosystemtechnik zur Herstellung von integrierten Schaltungen und weiteren Produkten. Dabei wird mittels der Belichtung das Bild einer Fotomaske auf … Deutsch Wikipedia
Electronic design automation — (EDA) is the category of tools for designing and producing electronic systems ranging from printed circuit boards (PCBs) to integrated circuits. This is sometimes referred to as ECAD (electronic computer aided design) or just CAD. (Printed… … Wikipedia
65 nanometer — The 65 nanometer (65 nm) process is an advanced lithographic node used in volume CMOS semiconductor fabrication. Printed linewidths (i.e., transistor gate lengths) can reach as low as 25 nm on a nominally 65 nm process, while the pitch between… … Wikipedia
Synopsys — Not to be confused with Synopsis Infobox Company company name = Synopsys, Inc. company company type = Public foundation = 1986 location = key people = Aart J. de Geus, CEO/Chairman Chi Foon Chan, President/COO num employees = 5,130 (October 2006) … Wikipedia
arts, East Asian — Introduction music and visual and performing arts of China, Korea, and Japan. The literatures of these countries are covered in the articles Chinese literature, Korean literature, and Japanese literature. Some studies of East Asia… … Universalium
